ICAMD 2025: Abstract Submission Open – Join Us in Busan!
We are excited to announce that abstract submission is now open for the 11th International Conference on Advanced Materials and Devices (ICAMD), which will take place from December 5th to December 8th, 2025, at the Ramada Plaza Jeju Hotel in Jeju, Korea. This renowned event is hosted by the Korean Physical Society and serves as a key gathering for scientists and experts in applied physics and related fields.
Min Hyuk, one of the conference organizers, will be leading a special session on “Materials and Devices for Advanced CMOS Technology (MA)”, offering a unique platform for discussion and collaboration on cutting-edge developments in the field of CMOS technology.
Additionally, Laura will be traveling to Busan to deliver an in-person talk, where she will share her latest research insights. This promises to be a valuable opportunity for networking and learning from leaders in materials science and device technology.
For more information and to submit your abstract, please visit the official ICAMD website: https://www.icamd.or.kr
ViTFOX Strengthens International Collaboration at Graz Meeting
The ViTFOX project consortium recently held a productive meeting at the headquarters of Silicon Austria Labs (SAL) in Graz, Austria. The event brought together key collaborators, including representatives from both the European and Korean partners, for crucial face-to-face discussions. The primary agenda was to share the latest research results and to collaboratively organize a strategic plan for the future of the project. The meeting successfully reinforced the international partnership and established a clear roadmap for the upcoming phases of ViTFOX.
New review article from our ViTFOX partner
We are pleased to highlight a recent review by Min Hyuk Park and colleagues, published in Chemical Communications.
Title:
HfO₂-based ferroelectric synaptic devices: challenges and engineering solutions
This comprehensive review explores the current limitations of HfO₂-based ferroelectric memories for neuromorphic applications and outlines recent material and device-level engineering approaches aimed at improving their synaptic performance and reliability.
Read the article:
https://pubs.rsc.org/en/content/articlelanding/2025/cc/d4cc05293e
New publication from our ViTFOX partner
We are pleased to highlight a recent publication by Min Hyuk Park and collaborators.
Title:
Enhancement of electrical properties of morphotropic phase boundary in Hf₁₋ₓZrₓO₂ films by integrating Mo electrode and TiN interlayer for DRAM capacitors
This work demonstrates how introducing a TiN interlayer beneath a Mo top electrode significantly improves the electrical performance and reliability of ferroelectric Hf₀.₃Zr₀.₇O₂ films. The optimized stack exhibits low leakage current density and an equivalent oxide thickness suitable for DRAM capacitor applications.
Read the paper:
https://www.sciencedirect.com/science/article/pii/S2666523925000418
Upcoming Talk @ ETH Zurich – Synaptic Plasticity in Action
Join us on Thursday, May 8th at 16:00 (ETZ H71) for an exciting research talk by Stavros Kitsios, visiting from the National Center for Scientific Research “Demokritos” (Athens, Greece).
In his talk, “Synaptic plasticity in epitaxial HfZrO₄ // SrTiO₃ heterostructures”, Stavros will share cutting-edge insights into neuromorphic materials and interface engineering.
This event is part of the collaborative efforts between ETH Zurich and NCSRD within the ViTFOX EU project.
Advancing Ferroelectric Hafnia: A Europe–Korea Research Exchange
As part of the BK21 MSE Seminar Series hosted by Chungnam National University (CNU), we’re excited to highlight an international collaboration between European and Korean researchers focusing on ferroelectric HfO₂-based materials. This dynamic seminar series features top experts sharing cutting-edge research on advanced materials for microelectronics, including contributions from ETH Zurich, NIMS Japan, CSIC Spain, and more.
Exploring Sustainable and Responsible AI
Join us at ETH Zurich for an interdisciplinary symposium bringing together voices from neuroscience, computer science, and industry to rethink the future of intelligent systems. With talks on neuromorphic hardware, bio-inspired computing, and the environmental impact of AI, the event fosters dialogue around energy-efficient and ethically responsible AI design. More information here: https://collegium.ethz.ch/events/fellow-year-2024-2025/ai-reimagined
Kick-Off Meeting // 7.02.2025 // Zürich, Switzerland. ETH Zürich will host the kick-off meeting in the historical building of ETH. An attendance of 13 researchers is planned in person, including two Korean PIs. The hybrid format will allow further participation.
Silicon Austria Labs (SAL) is one of the official supporters of IEEE ISAF 2025 (International Symposium on Applications of Ferroelectrics). The conference will be held in Graz, Austria, in July 2025. Dr. Marco Deluca, ViTFOX PI for SAL, is also a member of IEEE-UFFC Ferroelectrics Standing Committee.
On the occasion of the 75th anniversary of the IEEE Circuits and Systems Society, ETH Zürich and UZH Institute of Neuroinformatics organized a workshop on 29/11/24. The elections for the new chair (Laura Bégon-Lours, ViTFOX PI for ETH Zürich) and secretary (Mathieu Coustans) of the Swiss IEEE joint CAS/ED chapter were held.