November 20, 2025 – ViTFOX at EFECS 2025 — Visit our booth!
The ChipsJU-funded ViTFOX (Vision Transformers with Ferroelectric Oxides) project will be showcased at EFECS 2025, the premier European Forum for Electronic Components and Systems. Taking place in Malta on December 3–4, 2025, EFECS brings together industry leaders, policymakers, researchers, and innovators to strengthen Europe’s strategic leadership in semiconductor technologies.
Come meet the team, discover our latest progress, and exchange ideas on future applications of ferroelectric oxides for next-generation computing.
November 18, 2025 – ICAMD 2025: Abstract Submission Open – Join Us in Busan!
We are excited to announce that abstract submission is now open for the 11th International Conference on Advanced Materials and Devices (ICAMD), which will take place from December 5th to December 8th, 2025, at the Ramada Plaza Jeju Hotel in Jeju, Korea. This renowned event is hosted by the Korean Physical Society and serves as a key gathering for scientists and experts in applied physics and related fields.
Min Hyuk, one of the conference organizers, will be leading a special session on “Materials and Devices for Advanced CMOS Technology (MA)”, offering a unique platform for discussion and collaboration on cutting-edge developments in the field of CMOS technology.
Additionally, Laura will be traveling to Busan to deliver an in-person talk, where she will share her latest research insights.
For more information and to submit your abstract, please visit the official ICAMD website: https://www.icamd.or.kr
October 30, 2025 – Prof. Min Hyuk Park receives the Choi Ho Young Award from the Korean Institute of Metals and Materials
Congratulations to ViTFOX partner Prof. Min Hyuk Park on receiving the prestigious Choi Ho Young Award from the Korean Institute of Metals and Materials. This distinction recognizes his outstanding contributions to electronic and information materials, particularly in the field of ferroelectric materials and emerging nanoelectronic technologies.
Presented by Korea’s leading professional society in materials science, this award highlights Prof. Park’s significant impact on advancing next-generation electronic materials and reinforces the international leadership of ViTFOX partners in ferroelectric research and neuromorphic computing.
July 16, 2025 – ViTFOX Strengthens International Collaboration at Graz Meeting
The ViTFOX project consortium recently held a productive meeting at the headquarters of Silicon Austria Labs (SAL) in Graz, Austria. The event brought together key collaborators, including representatives from both the European and Korean partners, for crucial face-to-face discussions. The primary agenda was to share the latest research results and to collaboratively organize a strategic plan for the future of the project. The meeting successfully reinforced the international partnership and established a clear roadmap for the upcoming phases of ViTFOX.
July 3, 2025 – ViTFOX partner Prof. Min Hyuk Park receives Nano Convergence Young Investigator Lectureship Award
ViTFOX partner Prof. Min Hyuk Park was honored with the Young Investigator Lectureship Award at the Nano Convergence Special Session 2025, in recognition of his outstanding contributions to the field of ferroelectric materials and emerging nanoelectronic technologies. As part of this distinction, Prof. Park was invited to deliver a special lectureship at the conference, highlighting recent advances in hafnia-based ferroelectric devices for next-generation computing applications.
June 16, 2025 – ViTFOX presents breakthrough ferroelectric AI hardware at the EU–Republic of Korea Semiconductor Researchers Forum
The ViTFOX consortium presented its latest technological advances at the EU–Republic of Korea Semiconductor Researchers Forum held in Jeju, South Korea. The presentation highlighted the development of silicon-compatible ferroelectric devices based on hafnium oxide, enabling energy-efficient computing-in-memory architectures for Vision Transformer applications.
The forum also provided an opportunity to strengthen collaboration between European and Korean partners and to accelerate the development and future commercialization of ferroelectric-based neuromorphic hardware.
June 13, 2025 – IEEE Swiss Women in CAS/ED
May 18, 2025 – Advancing Ferroelectric Hafnia: A Europe–Korea Research Exchange
As part of the BK21 MSE Seminar Series hosted by Chungnam National University (CNU), we’re excited to highlight an international collaboration between European and Korean researchers focusing on ferroelectric HfO₂-based materials. This dynamic seminar series features top experts sharing cutting-edge research on advanced materials for microelectronics, including contributions from ETH Zurich, NIMS Japan, CSIC Spain, and more.
May 4, 2025 – Exploring Sustainable and Responsible AI
Join us at ETH Zurich for an interdisciplinary symposium bringing together voices from neuroscience, computer science, and industry to rethink the future of intelligent systems. With talks on neuromorphic hardware, bio-inspired computing, and the environmental impact of AI, the event fosters dialogue around energy-efficient and ethically responsible AI design. More information here: https://collegium.ethz.ch/events/fellow-year-2024-2025/ai-reimagined
Aprils 28, 2025 – Upcoming Talk @ ETH Zurich – Synaptic Plasticity in Action
Join us on Thursday, May 8th at 16:00 (ETZ H71) for an exciting research talk by Stavros Kitsios, visiting from the National Center for Scientific Research “Demokritos” (Athens, Greece).
In his talk, “Synaptic plasticity in epitaxial HfZrO₄ // SrTiO₃ heterostructures”, Stavros will share cutting-edge insights into neuromorphic materials and interface engineering.
This event is part of the collaborative efforts between ETH Zurich and NCSRD within the ViTFOX EU project.
March 19, 2025 – New publication from our ViTFOX partner
We are pleased to highlight a recent publication by Min Hyuk Park and collaborators.
Title:
Enhancement of electrical properties of morphotropic phase boundary in Hf₁₋ₓZrₓO₂ films by integrating Mo electrode and TiN interlayer for DRAM capacitors
This work demonstrates how introducing a TiN interlayer beneath a Mo top electrode significantly improves the electrical performance and reliability of ferroelectric Hf₀.₃Zr₀.₇O₂ films. The optimized stack exhibits low leakage current density and an equivalent oxide thickness suitable for DRAM capacitor applications.
Read the paper:
https://www.sciencedirect.com/science/article/pii/S2666523925000418
February 7, 2025 – ViTFOX Kick-Off Meeting held at ETH Zürich, Switzerland.
The ViTFOX consortium held its official kick-off meeting at ETH Zürich, marking the first in-person gathering of the project partners. Hosted in the historic ETH main building, the meeting brought together 13 researchers, including principal investigators from both European and Korean institutions, to present their research activities and define the scientific roadmap of the project.
This milestone meeting provided an important opportunity to exchange ideas, align research objectives, and strengthen collaboration across the consortium. Additional participants joined remotely, ensuring broad engagement and reinforcing the international dimension of the ViTFOX project.
January 8, 2025 – New review article from our ViTFOX partner
We are pleased to highlight a recent review by Min Hyuk Park and colleagues, published in Chemical Communications.
Title:
HfO₂-based ferroelectric synaptic devices: challenges and engineering solutions
This comprehensive review explores the current limitations of HfO₂-based ferroelectric memories for neuromorphic applications and outlines recent material and device-level engineering approaches aimed at improving their synaptic performance and reliability.
Read the article:
https://pubs.rsc.org/en/content/articlelanding/2025/cc/d4cc05293e
November 29, 2024 – IEEE Circuits and Systems workshop and chapter elections held in Zürich
On the occasion of the 75th anniversary of the IEEE Circuits and Systems Society, ETH Zürich and the Institute of Neuroinformatics (ETH Zürich and University of Zürich) co-organized a workshop bringing together researchers and experts in circuits, devices, and neuromorphic engineering.
During this event, Laura Begon Lours, ViTFOX Principal Investigator at ETH Zürich, was elected Chair of the Swiss IEEE joint Circuits and Systems and Electron Devices chapter, with Mathieu Coustans elected as Secretary.